Modelling of pulsed electron beam induced graphite ablation: Sublimation versus melting

Pulsed Electron-Beam Heating

A pulsed, 20 kv electron beam is focussed upon a vapor-deposited thermocouple, and the resulting temperature vs. time response is studied. The experimental data show much scatter, but are consistent with the theoretical prediction that the characteristic thermal response time T is proportional to d , where d is the beam diameter at the thermocouple. From these data, for the soft-glass substrate...

Graphite Sublimation Tests

Electron beam ablation of materials

The channelspark, a low accelerating voltage, high current electron beam accelerator, has been used for ablation of materials applied to thin film deposition. The channelspark operates at accelerating voltages of 10 to 20 kV with ;1500 A beam currents. The electron beam ionizes a low-pressure gas fill ~10–20 mTorr Ar or N2) to compensate its own space charge, allowing ion focused transport. Abl...

Evaluation of Titanium Alloys Fabricated Using Rapid Prototyping Technologies—Electron Beam Melting and Laser Beam Melting

This study characterized properties of Ti-6Al-4V ELI (extra low interstitial, ASTM grade 23) specimens fabricated by a laser beam melting (LBM) and an electron beam melting (EBM) system for dental applications. Titanium alloy specimens were made into required size and shape for each standard test using fabrication methods. The LBM specimens were made by an LBM machine utilizing 20 µm of Ti-6Al-...

Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

[This corrects the article DOI: 10.3762/bjnano.8.214.].